Timings

About the Simulations Performed Here:

All calculations performed here use the same general level set methodology, and were run on an Ultra Sparc 2. While level set methods are nearest neighbor stencil schemes, and hence easily parallelize, and we have performed some multi-threading in complex cases, times presented below are for a single processor calculation.

Timings:

	\|	2D: 50x50	\|	2D: 100x100	\|	3D: 40x40x40	\|	3D: 80x80x80
Photolithography Development	\|	6.9 ms (Entire Run)	\|	26 ms (Entire Run)	\|	.16 secs (Entire Run)	\|	2.1 secs (Entire Run)
Ion-Milling with Visibility	\|	23 ms	\|	70 ms	\|	.7 secs	\|	5.7 secs
Re-Deposition/Re-emission	\|	65 ms	\|	.3 secs	\|	24 secs	\|	12.6 min

Time per time step of calculation: Sparc Ultra

Return to Overview Page